High NA EUV
Latest about High NA EUV

Company proposes 'tabletop' particle accelerators with petawatt lasers
By Anton Shilov published
Y-Combinator-backed startup eyes powerful laser wakefield accelerator for advanced lithography techniques.

TSMC reiterates it doesn't need High-NA EUV for 1.4nm-class process technology
By Anton Shilov published
But we will use it eventually.

Intel has championed High-NA EUV chipmaking tools, but costs and other limitations could delay industry-wide adoption: Report
By Anton Shilov published
Delay, but not stop.

ASML teams up with Imec for sub-2nm process technologies with High-NA EUV chipmaking tools
By Anton Shilov published
ASML to install its High-NA EUV lithography tools in Imec's pilot production line to give research and development personnel access to leading-edge equipment.

Intel has processed 30,000 wafers with High-NA EUV chipmaking tool
By Anton Shilov published
Intel says ASML's High-NA EUV tools have produced 30,000 wafers in a single quarter.

American lab is developing a BAT laser that could enable 'beyond EUV' lithography
By Anton Shilov published
Petawatt-class thulium lasers could replace CO2 lasers in lithography machines down the road.

ASML made a $230 Lego kit version of its $380 million semiconductor tool
By Mark Tyson published
ASML has added the TWINSCAN EXE:5000 Lego set to its growing portfolio of gifts.

TSMC rumored to receive High NA EUV machines from ASML this year
By Jowi Morales published
TSMC is set to receive its first shipment of ASML's High NA EUV machine later this year.
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